Tunable ArF excimer-laser source.

State-selective detection of CO using a tunable ArF excimer laser

Generation of 224-nm radiation by stimulated Raman scattering of ArF excimer laser radiation in a mixture of H2 and D2.

Raman shifting of tunable ArF excimer laser radiation in a mixture of H(2) and D(2) produces tunable radiation in the 224-nm region as a result of Stokes shifting the frequency of the fundamental radiation (193 nm) once in both H(2) and D(2). At a total pressure of 25 bars, a 19% H(2) in D(2) mixture is found to provide a maximum conversion efficiency (2.5%) to the 224-nm range. Both fundamenta...

Progress of Excimer Laser Technologies

Resent technical progress of laser technologies for microlithography is discussed here. The performance of highly durable 2kHz KrF excimer laser, and next generation light source of 2kHz ArF excimer laser, which are realized by the new technologies, are discribed. We also discuss about its impact on microlithography. Further more F2 laser development program in Japan and its latest result which...

Femtosecond gain characteristics of the discharge-pumped ArF excimer amplifier.

The gain characteristics of a discharge-pumped ArF excimer amplifier are measured with ~700-fs-long pulses. The small-signal gain and saturation energy are found to be 0.17 cm(-1) and 3.65 +/- 0.15 mJ/cm(2), respectively. The maximum output energy density extracted from the deeply saturated amplifier is as much as 10 mJ/cm(2). The demonstrated femtosecond gain characteristics of ArF indicate th...

Photosensitivity in Ge-doped silica optical waveguides and fibers with 193-nm light from an ArF excimer laser.

Photosensitivity in optical fibers and waveguides has been associated with the bleaching of an absorption band located near 5.0 eV (or 242 nm). We present new results for Bragg grating formation and UV bleaching experiments carried out using 193-nm light from an ArF excimer laser instead of the usual laser sources operating near 242 or 248 nm.